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Optical Critical Dimension Measuring Systems

MicroLine 420

Many modern manufacturing operations require dimensional or positioning accuracies in the sub-micron region. Noncontact measuring techniques are often required because the components being measured are in general very small and delicate. View Micro-Metrology offers two solutions for these high-accuracy measurements: field of view (FOV) and point-to-point (PTP) systems.

The MicroLine systems give FOV measurements and the Precis 200 system combines both FOV and PTP measurements.

Microline

MicroLine 300

The MicroLine® series of non-contact critical dimensional measurement systems are ideal for semiconductor and MEMS applications.

MicroLine critical dimension measurement systems are designed specifically for semiconductor and MEMs wafer and photomask CD metrology. MicroLine systems automatically measure linewidth, overlay registration, and other critical features.

MicroLine Systems are equipped with the highest quality microscope optics and precision motion stages, providing capability to measure features from 0.5 µm to 400 µm in size. Typical measurement accuracy and repeatability is 10 nm at 1 δ (with 100x objective).

The MicroLine is offered in four configurations:

MicroLine 300:
Benchtop manual X,Y stage critical dimension measurement system

MicroLine 400:
Benchtop critical dimension measurement system with motorized X,Y stage

MicroLine 420:
Fully automated critical dimension measurement system

MicroLine 520:
Automated critical dimension measurement system with automated wafer loader

Precis

Precis 200

The all-new Precis® incorporates the most advanced design and technology from VIEW-MM.

Based on the proven Innova wafer metrology system from Micro-Metric, the new Precis includes a number of configurable options that make the system more versatile, serviceable and reliable:

  • Extended Z-axis range – 2.5mm, 5mm or 100mm
  • Transmitted illumination
  • Integral electronics drawer – fully compliant with SEMI S2 and CE standards
  • Ergonomic operator control station with hide-away keyboard tray, adjustable height and angle for control panel and display monitor, SEMI S8 compliant
  • Fully automated microscope with all settings computer controlled
  • Megapixel camera for optimum resolution
  • VIEW Metrology Software (VMS™) allows a wide range of components to be measured, with the option of CAD translation and full geometric dimensioning and tolerancing.
  • MMWin – wafer and mask metrology software – ideal for critical dimension and overlay registration measurement for wafers, slider ABS, photomask and flat panel displays.