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VSPARTICLE VSP-P1 Nanoprinter

Product Code:
VSP-P1
Manufacturer: VSPARTICLE

Local deposition of nanoporous thin-films. When connected to the output of the VSP-G1, the VSP-P1 enables you to print inorganic nanostructured materials with novel properties. The material is built-up of sub 20nm pure particles, and can be printed in patterns locally on any type of substrate.

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This new way of additive manufacturing can greatly simplify the production of nanoporous thin films and layers with a high surface-to-volume ratio. The applications of such films are numerous and include for example electrocatalysis, chemical, optical or biological sensing as well as the fabrication of batteries and microelectronics. ​

The VSP-P1 NanoPrinter enables you to locally print inorganic nanostructured materials with unique properties. The building blocks for the printed layer are gas-phase produced, sub-20 nm nanoparticles, free of surfactants or any other organic impurities. ​With the VSP-P1 NanoPrinter, semi-automated printing of nano porous layers of different composition and/or layer thicknesses is possible.

  • Aerodynamic size 0-300nm, particle size 0-20nm
  • Any (semi) conductive material
  • Stable & reproducable
  • Quick & easy to use
  • Based on spark ablation technology
  • Clean process: no surfactants or precursors

Material Versatility
You can print all (semi)conductive materials. This allows for the creation of particles of bimetallic particles, nano-alloys or materials that are immiscible in bulk state. Also non-metallic compounds can be made such as oxides and hydrides, by mixing small quantities of a non-inert gas in the carrier gas.

No Handling of Nanoparticles
The VSP-P1 combines generation, combination and deposition of nanoparticles in one automated process, enabling you to print new nanoscale materials without handling nanoparticles. The complete system is operated through a secure and intuitive web interface that allows for automated material production. 

Benefits of Additive Manufacturing
The ability to locally deposit nanoporous thin films with a high surface-to-volume ratio in an additive manner greatly simplifies the manufacturing of materials for various applications (e.g. chemical, optical and biosensing, electro/photocatalysts and electrode materials (e.g. for micro-batteries or bio-electronics). 

Unique features of the VSP-P1

Local deposition

  • Spot size 100 μm and position accuracy 10 μm
  • Working conditions room temperature and rough vacuum (0.2 mbar)
  • XYZ-control to print any type of pattern

Nanoporous film

  • Stable porous structure at ambient conditions
  • Consists of sub 20 nm nanoparticles
  • High surface-to-volume ratio

Material versatility

  • Compatible with all (semi)-conductive materials
  • Multi-element composition possible (alloy and non-alloy)
  • Non-metallic compounds can be made (e.g. metal oxides, hydrides), by mixing small quantities of a non-inert gas (e.g. O₂, H₂) in the carrier gas.

Clean particles

  • Only inputs needed are power, electrodes and carrier gas
  • Clean, model nanoparticles: No surfactants or precursor salts
  • No influence of contaminants on particle properties
  • Eliminates the need for post-processing step

LEE-BED
While VSPARTICLE is at the beginning of its technological roadmap, the challenge of scaling our technology is already being addressed. 

Since January 2019 VSParticle is participating in the Horizon 2020 project: Innovation test bed for development and production of nanomaterials for lightweight embedded electronics (LEE BED). Within this project we scale up our print technology into a gas phase pilot line. The open access pilot line allows you to bring your application ideas and concepts to a pilot production.

 

Operating window

Target Electrode material metals, metal oxides, alloys, semiconductors, carbon
Particle size 1 atom to 20 nm
Max substrate size 20 × 20 cm
Layer thickness

From sparse distribution of agglomerates (100 nm)
to a few microns

Substrate types e.g. MEMS, SERS, Si wafer, flexible polymers
Spot size 100 μm up to ~1 cm
Layer morphology nanoporous
Production rate mg/h
Carrier gas

Ar, N2, Ar + O2, Ar + H2

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