Fischione Model 1061 SEM Mill (Ion Milling)

Model 1061 TEM Mill specifications

Ion sources

Two TrueFocus ion sources

Variable energy (100 eV to 10 kV) operation

Beam current density up to 10 mA/cm2

Milling angle range of 0 to +10˚

Choice of single or dual ion source operation

Independent ion source energy control

Manual or motorized (optional) ion source angle adjustment

Adjustable spot size

Faraday cups for the direct measurement of beam current from each ion source; allows optimization and adjustment of the ion source parameters for specific applications

Sample stage

Sample size:

• Cross section*

Maximum: 0.39 x 0.39 x 0.157 in. (10 x 10 x 4.0 mm) Minimum: 0.12 x 0.12 x 0.028 in. (3 x 3 x 0.7 mm)

• Planar

1.25 in. diameter x 1 in. height (32 x 25 mm)

Automatic sample thickness sensing to establish the milling plane and maximize throughput

360˚ sample rotation with variable rotation speed

Sample rocking

Magnetic encoder provides absolute positioning accuracy

Cross-section station (optional)

Produces pristine cross-section samples

Allows precise positioning of the area of interest – x, y, and e

Effective for use with a wide variety of materials, including semiconductor devices, multilayers, ceramics, and hard/ brittle materials

Prepared region of interest is flat and free from damage for subsequent SEM imaging and analysis

Accommodates a wide range of sample and mask sizes:

• Sample and mask align both laterally and angularly

• Multiple uses from a single mask

Sample cooling (optional)

Liquid nitrogen conductive cooling with integral dewar and automatic temperature interlocks

Achieves temperatures better than -170 °C

Dewar access positioned close to instrument operator

Ability to program and maintain a specific temperature between ambient and cryogenic

Choice of:

• Standard dewar capacity (3 to 5 hours of cryo conditions)

• Extended dewar capacity (18+ hours of cryo conditions)

Automatic termination

Automatic termination by time or temperature

Vacuum system

Turbomolecular drag pump and an oil-free, multi-stage diaphragm pump

Vacuum sensing with a cold cathode, full-range gauge

Vacuum or inert gas transfer capsule (optional)

Allows transfer or storage of a sample at vacuum or in an inert gas environment

Process gas

UHP argon (99.999%); nominal 15 psi delivery pressure required

Automatic gas control using two mass flow controllers

User interface

Instrument operation controlled via 10-inch, ergonomically adjustable touch screen

Stack light indicator for determining milling operations status from a distance (optional)

Microscope (optional)

Load lock window accommodates the following microscopes:

• 7 to 45X stereo microscope attachment for direct specimen observation

• 525X high-magnification microscope and CMOS (complementary metal oxide semiconductor) camera system for site-specific image acquisition and display

• 1,960X high-magnification microscope and CMOS camera system for site-specific image acquisition and display

In situ viewing and imaging

Sample can be monitored in situ in the milling position when using either the stereo or the high-magnification microscope

Viewing window protected by a programmable shutter that prevents buildup of sputtered material and preserves the ability to observe the sample in situ

Sample illumination

Both the high-magnification and stereo microscopes have light sources that provide top-down, user adjustable, reflected sample illumination

Enclosure

Width (includes room on either side for service access: 50 in. (127 cm)

Height:

• Minimum height (without microscope or stack light options): 32 in. (61 cm)

• Maximum height (with stack light option): 38 in. (77 cm)

Depth (includes room for service access and exhaust fan air flow): 40 in. (102 cm)

Enclosure design offers easy access to internal components when performing maintenance tasks

Weight

161 lb. (73 kg)

Power

100/120/220/240 VAC, 50/60 Hz, 720 W

Warranty

One year

* Standard size; other sizes available upon request.